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TechnicalFeature  技术特写


      像素中点所导致的。图5(b)和5(d)显示使                                           表2
      通道处于像素成像区域边界的像素对齐                                 FEA 温度解决方案与红外测量、总误差
      影响。这种情况下,2.5µm×2.5µm区域
                                                          尺寸                  真正的最高温度      红外测量的表面温度
      的平均表面温度会低估最高通道温度,                   测量主体或区域        (μm x μm)  辐射系数          (℃)           (℃)
      低估值超过 15℃。使用5µm×5µm面积
      会使误差扩大到21℃。                         仿真 GaN 器件        -          -          204.3           -
         对于GaN热分析,亚微米工艺常                     表面积        2.5×2.5      1.00          -            189.1
      用来制造晶体管,其热点远小于0.25微                    表面积        2.5×2.5      0.85          -            171.1
      米,而红外显微镜只能解析尺寸数量级                      表面积        5.0×5.0      1.00          -            183.0
      更大的——得到完整的细节。
                                             表面积        5.0×5.0      0.85          -            164.9
         此外,红外热成像仅测量晶体管的
      表面温度,而峰值温度实际上发生在表                 和可重复性。                            GaN 的热设计和分析流程,具备业界领
      面下方的氮化镓外延层。在半导体材料                     这里展开讨论了上述示例中辐射系               先的精确性。■
      的热时间常数超出热源的脉冲工作情况                 数的影响。假定测量条件如上所述,可                 参考文献
      下,这种测量温度的降幅将扩大,影响                 以看到红外热成像低估了峰值GaN通道                1.  N. Killat and M. Kuball, University of Bristol, H.H. Wills
      测量温度范围。                           温度,低估值高达40℃。                         Physics Laboratory; T.-M. Chou, U. Chowdhury, and J. Jimenez,
                                                                             Qorvo, Inc. Temperature Assessment of AlGaN/GaN HEMTs: A
         最后,裸片表面的辐射系数(ε)快                   上述建模结果表明,兼容统一的热                  Comparative study by Raman, Electrical and IR Thermography
      速变化。常见的解决方案是在裸片上喷                 测量技术对GaN器件来说至关重要。采                2.  J. Pomeroy, M. Bernardoni, M. Kuball, H.H. Wills Physics
                                                                             Laboratory, University of Bristol; D.C. Dumka, D.M. Fanning,
      涂哑光黑,以得到接近ε=1的结果,但无               用最初针对低功耗半导体技术和/或更大                   Qorvo, Inc. Low Thermal Resistance GaN-on-Diamond
      法真正创建一个持续的黑体。这会产生                 几何尺寸开发的工具和技术会产生明显                    Transistors Characterized by 3-D Raman Thermography Mapping
                                                                          3.  S. Kiefer, M. Nair, P. Sanders, J. Steele, M. Sutton, R.
      另一个挑战,即涂料对裸片产生介电负                 误差。这些误差可能会导致可靠性估计                    Thoma, S. Wilson, Motorola Digital DNA Laboratories; G.
      荷,它可能难以预测,且通常是不连续                 错误,并且会损害产品功能。Qorvo采                  Albright, C. Li, J. McDonald, Quantum Focus Inc. Infrared
                                                                             Microthermography for Integrated Circuit Fault Location;
      的。这会改变RF性能,进而影响精确性                用当今最灵敏的测量工具开发出了针对                    Sensitivity and Limitations
      上接第42页
                                     表1                                   SCM模式出发,通过构造漏极电压和电
                                                                          流波形获得的。这些模式可以扩展最优
                            最先进的宽带功率放大器性能
                                                                          阻抗实部的解决方案,提供更高的设计
                          Output     Drain                                灵活度以提高器件性能。■
                Bandwidth                       Gain             Design
      Reference           Power                        FE  FOM
                  (GHz)    (W)        (%)       (dB)              Type    参考文献
                                                                          1.  S. C. Cripps, "RF Power Amplifiers for Wireless Communications,"
                                               10.2 to
          4     1.5 to 2.5  9 to 11.5  60 to 70 (65)  77.3  298.5  Class J   2nd Edition, Artech House, Norwood, Mass., 2006.
                                                12.2                      2.  S. C. Cripps, P. J. Tasker, A. L. Clarke, J. Lees and J.
                           11 to                10 to                        Benedikt, “On the Continuity of High Efficiency Modes
          5     1.45 to 2.45      70 to 81 (75.5)     89.2  462.6  CF        in Linear RF Power Amplifiers,” IEEE Microwave and
                           16.8                 12.6                         Wireless Components Letters, Vol. 19, No. 10, October
                                                                   CF/       2009, pp. 665–667.
          6     1.3 to 3.3  10 to 15  60 to 83 (72.7)  10 to 13  89.5  552.8  -1  3.  V. Carrubba, A. L. Clarke, M. Akmal, J. Lees, J. Benedikt,
                                                                  CF
                                                                             P. J. Tasker and S. C. Cripps, “The Continuous Class F
                                   70.3 to 81.9   11.9 to                    Mode Power Amplifier,” Proceedings of the 40th Europe
          7     1.6 to 2.7  10.2-17.8                 92.5  669.9  SCMs
                                     (76.4)     15.2                         Microwave Conference, September 2010, pp. 1674–1677.
                                                                          4.  P. T. Wright, J. Lees, J. Benedikt, P. J. Tasker and S. Cripps,
                          10.9 to   69.5 to 77.9   9.8 to                    “A Methodology for Realizing High Efficiency Class J in a
       This Work  2.3 to 3.8                          95.3  1126.5  NSCMs
                           19.5      (72.1)     12.3                         Linear and Broadband PA,” IEEE Transactions Microwave
                                                                             Theory and Techniques, Vol. 57, No. 12, December 2009,
      Notes:                                                                 pp. 3196–3204.
             0.25                                                         5.  N. Tuffy, L. Guan, A. Zhu and T. J. Brazil, “A Simplified
      FE = AE*f c                             c  =  Center Frequency         Broadband Design Methodology for Linearized High
            2
      FoM = f c *AE*AP*AG, where AP = Average Output Power and AG = Average Gain   Efficiency Continuous Class F Power Amplifiers,”IEEE
      CF = Continuous F                                                      Transactions Microwave Theory and Techniques, Vol. 60,
      CF -1  = Continuous F -1                                               No. 6, June 2012, pp. 1952–1963.
      SCMs = Series of Continuous Modes                                   6.  K. Chen and D. Peroulis, “Design of Broadband Highly
      NSCMs = Novel Series of Continuous Modes                               Efficient Harmonic-Tuned Power Amplifier Using In-
                                                                             Band Continuous Class (-1)/F Mode-Transferring,”IEEE
                                                                             Transactions on Microwave Theory and Techniques, Vol. 60,
         从实验结果中可以看到,在2.3到               因数9用于功率放大器性能的评估,表1                   No. 12, December 2012, pp. 4107–4116.
                                                                          7.  J. Chen, S. He, F. You, R. Tong and R. Peng, “Design of
      3.8GHz频率范围内,漏极效率范围为               同时还提供了所设计的功率放大器和之                    Broadband High-Efficiency Power Amplifiers Based on
      69.5%到77.9%,功率附加效率在63.5%          前发表的作品的完整比较。FE表示频率                   a Series of Continuous Modes,” IEEE Microwave and
                                                                             Wireless Components Letters, Vol. 24, No. 9, September
      到73.4%之间。整个频率范围内的增益               加权后的平均效率。ITRS功率放大器品                  2014, pp. 631–633.
      和输出功率范围分别为9.8到12.3dB以及            质因数还考虑了除漏极效率和频率以外                 8.  Z. Dai, S. He, F. You, J. Peng, P. Chen and L. Dong, “A
                                                                             New Distributed Parameter Broadband Matching Method
      40.4dBm到42.9dBm。实验结果和仿真结          的输出功率和增益。对比这些测量结果                    for Power Amplifier via Real Frequency Technique,”IEEE
      果十分吻合。                            可以看出NSCM提供了卓越的性能。                    Transactions on Microwave Theory and Techniques, Vol. 63,
                                                                             No. 2, February 2015, pp. 449–458.
         表1总结了该功率放大器与其他最                                                  9.  Y. Song, S. Lee, E. Cho, J. Lee and S. Nam,” A CMOS Class
      先进连续型功率放大器的性能比较结                  结论                                   E Power Amplifier With Voltage Stress Relief and Enhanced
      果。改进的FE6和ITRS功率放大器品质                  NSCM是从传统的连续F类模式和                 Efficiency,” IEEE Transactions on Microwave Theory and
                                                                             Techniques, Vol. 58, No. 2, February 2010, pp. 310–317.
      48                                                            Microwave Journal China  微波杂志  May/Jun 2018
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